Semiconductor device having internal voltage generating circuit

ABSTRACT

A semiconductor device including a first internal voltage generating circuit that includes a capacitor including a first electrode and a second electrode, and the first internal voltage generating circuit to generate an internal voltage by charging the capacitor to a first voltage and applying a second voltage to the first electrode of the capacitor to generate a third voltage that is greater than the first and the second voltages on the second electrode in absolute value, and a control circuit to perform a control by applying a fourth voltage that is less than the first voltage to the capacitor when the first internal voltage generating circuit is in a standby state.

CROSS-REFERENCE TO RELATED APPLICATIONS

The present application is a Continuation application of U.S. patentapplication Ser. No. 14/664,128, filed on Mar. 20, 2015, which is aContinuation application of U.S. patent application Ser. No. 12/926,589,filed on Nov. 29, 2010, now U.S. Pat. No. 8,987,937 which issued on Mar.24, 2015, which is based on Japanese Patent Application No. 2009-271853filed on Nov. 30, 2009, all of which are hereby incorporated in theirentirety.

BACKGROUND OF THE INVENTION

Field of the Invention

The present invention relates to a semiconductor device, and moreparticularly relates to a semiconductor device including an internalvoltage generating circuit that generates an internal voltage by acharge pump operation.

Description of Related Art

Some semiconductor devices require a boost potential that is higher thana power source potential supplied from outside and a negative potentialthat is lower than a ground potential. Such semiconductor devicesinclude therein an internal voltage generating circuit that generates aboost potential and a negative potential (see Japanese PatentApplication Laid-open Nos. 2003-298957, 2007-325430, 2009-17717, and2009-116684). A representative example of the internal voltagegenerating circuit is a charge pump circuit that performs step up orstep down of a voltage by pumping using a capacitor. The charge pumpcircuit performs a boost operation by repeating a charge operation forcharging the capacitor and a discharge operation for pumping the chargedcapacitor.

An internal voltage, which is an output of an internal voltagegenerating circuit, is used in various circuit blocks included in asemiconductor device. When these circuit blocks are in a standby state,the internal voltage generating circuit is also in a standby state, tosave the power consumption. At this time, it is desirable to set theinternal voltage generating circuit to a standby state while it is in astate of a charge operation.

However, when the internal voltage generating circuit is maintained in astate of the charge operation, a predetermined voltage is kept beingapplied to both ends of the capacitor, and this causes a problem ofgenerating a certain degree of power consumption due to a leakagecurrent. Further, because the capacitor used in the internal voltagegenerating circuit has a considerably large capacitance as compared to acapacitor connected to a signal line, when low power consumption isrequired, the power consumption due to the leakage current may reach alevel that is not negligible.

SUMMARY

In one embodiment, there is provided a semiconductor device thatincludes: a first internal voltage generating circuit that includes acapacitor having a first electrode and a second electrode and generatesan internal voltage by repeating a charge operation for charging thecapacitor to a first voltage and a discharge operation for applying asecond voltage to the first electrode of the capacitor to generate athird voltage that is higher than the first and the second voltages onthe second electrode in absolute value; and a control circuit thatperforms a control to apply a fourth voltage that is lower than thefirst voltage to the capacitor when the first internal voltagegenerating circuit is in a standby state.

In another embodiment, there is provided a semiconductor device thatincludes: an internal voltage generating circuit that includes acapacitor having a first electrode and a second electrode, generates aninternal voltage in an active state, and suspends generation of theinternal voltage in a standby state; and a control circuit that controlsan operation of the internal voltage generating circuit, wherein whenthe internal voltage generating circuit is in an active state, thecontrol circuit performs a charge operation for charging the capacitorto a predetermined voltage and a discharge operation for changing apotential that appears on the second electrode by changing a potentialapplied to the first electrode in an alternate manner, and when theinternal voltage generating circuit is in a standby state, the controlcircuit suspends the charge operation.

In still another embodiment, there is provided a semiconductor devicethat includes: a capacitor having a first electrode and a secondelectrode; a first line for supplying a first potential; a second linefor supplying a second potential; a first switch that is connectedbetween the first electrode of the capacitor and the first line; asecond switch that is connected between the first electrode of thecapacitor and the second line; a third switch that is connected betweenthe second electrode of the capacitor and the second line; and a controlcircuit that controls the first to third switches based on at least astate signal, wherein the control circuit has a first control state toswitch on the first and third switches and switch off the second switch,and a second control state to switch on the second switch and switch offthe first and third switches, when the state signal is in an activatedstate, the control circuit repeats the first control state and thesecond control state in an alternate manner, and when the state signalis in a deactivated state, the control circuit maintains the secondcontrol state.

According to the present invention, because a voltage applied to bothends of a capacitor is reduced when the internal voltage generatingcircuit is in a standby state, it is possible to reduce the powerconsumption due to a leakage current.

BRIEF DESCRIPTION OF THE DRAWINGS

The above features and advantages of the present invention will be moreapparent from the following description of certain preferred embodimentstaken in conjunction with the accompanying drawings, in which:

FIG. 1 is a block diagram of a semiconductor device according to anembodiment of the present invention;

FIG. 2 is a block diagram showing a configuration of the control circuit40;

FIG. 3 is a circuit diagram of the control signal output circuit 43;

FIG. 4 is a circuit diagram of the internal voltage generating circuit20;

FIG. 5A is an equivalent circuit diagram showing a charge operation;

FIG. 5B is an equivalent circuit diagram showing a discharge operation;

FIG. 6 is a waveform diagram for explaining an operation of thesemiconductor device according to the present embodiment;

FIG. 7A is an equivalent circuit diagram showing an example of a standbystate;

FIG. 7B is an equivalent circuit diagram showing another example of astandby state;

FIG. 8 is a circuit diagram of an internal voltage generating circuit100 that generates a negative potential;

FIG. 9 is an operational waveform diagram of the internal voltagegenerating circuit 100; and

FIG. 10 is a diagram showing an example of a circuit that generatessignals A to D.

DETAILED DESCRIPTION OF THE EMBODIMENTS

A representative example of a technical concept of the present inventionis described below. That is, the technical concept of the presentinvention is to include a standby period to reduce a leakage currentbetween electrodes of a capacitor by performing a control to reduce avoltage applied to the electrodes, in addition to a charge period tocharge the capacitor and a discharge period to generate a boost voltageby pumping using a charge of the capacitor, in an internal voltagegenerating circuit that generates an internal voltage by a charge pumpfunction using the capacitor. A step-down voltage can be applied in thesame manner as the boost voltage as long as the internal voltagegenerating circuit employs the charge pump function.

Preferred embodiments of the present invention will be explained belowin detail with reference to the accompanying drawings.

FIG. 1 is a block diagram of a semiconductor device according to anembodiment of the present invention. In the present invention, the typeof the semiconductor device is not particularly limited, but can be amemory system device such as a DRAM and a flash memory, or a, logicsystem device such as a CPU and a DSP, as long as the semiconductordevice includes an internal voltage generating circuit.

As shown in FIG. 1, the semiconductor device according to the presentinvention includes a load circuit 10 and internal voltage generatingcircuits 20 and 30 that supply an internal potential VPP to the loadcircuit 10. The load circuit 10 is a main circuit block of thesemiconductor device. For example, when the semiconductor deviceaccording to the present embodiment is a DRAM, the load circuit 10corresponds to a memory cell array and various peripheral circuits (suchas a decoder, a counter, and an amplifier). The internal potential VPPis a potential that is higher than a power source potential VDD suppliedfrom outside via a power source terminal 1, which is used as anactivation potential for a word line, for example. A potentialdifference between the internal potential VPP and a ground potential GNDsupplied from outside via a power source terminal 2 is referred to as aninternal voltage VPP. In this manner, in this specification, a potentialitself and a potential difference (a voltage) with the ground potentialGND are explained using like reference numeral as appropriate. Althoughvarious potentials other than the internal potential VPP are supplied tothe load circuit 10, explanations of these potentials are omitted.

Operations of the internal voltage generating circuits 20 and 30 arecontrolled by signals A to F supplied from control circuits 40 and 50,respectively. That is, the two internal voltage generating circuits 20and 30 are subject to separate controls from each other. The internalvoltage generating circuit 20 is a primary circuit for generating theinternal potential VPP, which generates the internal potential VPP in anactive state, while suspending the generation of the internal potentialVPP in a standby state. The internal voltage generating circuit 20 isdesigned to be capable of maintaining the internal potential VPP to adesired level even when a load of the load circuit 10 is maximized. Onthe other hand, the internal voltage generating circuit 30 is asecondary circuit for generating the internal potential VPP, whichconstantly generates the internal potential VPP. The internal voltagegenerating circuit 30 is designed to be capable of maintaining theinternal potential VPP to a desired level when the load circuit 10 andthe internal voltage generating circuit 20 are in a standby state. Thatis, the voltage generating capability of the internal voltage generatingcircuit 30 is designed to be smaller sufficiently than that of theinternal voltage generating circuit 20. Therefore,

As shown in FIG. 1, the internal potential VPP is fed back to thecontrol circuit 40 via a power source line 90, and at the same time, areference potential VREF that is an output of a reference potentialgenerating circuit 60, a state signal ST that is an output of a commanddecoder 70, and a power-on signal PON that is an output of a power-ondetection circuit 80 are supplied to the control circuit 40. The controlcircuit 40 generates the signals A to F based on the internal potentialVPP, the reference potential VREF, the state signal ST, and the power-onsignal PON, to control the operation of the internal voltage generatingcircuit 20. Similarly, the internal potential VPP is fed back to thecontrol circuit 50 via the power source line 90, and at the same time,the reference potential VREF and the power-on signal PON are supplied tothe control circuit 40; however, the state signal ST that is the outputof the command decoder 70 is not supplied to the control circuit 50.

The reference potential generating circuit 60 is a circuit thatgenerates the reference potential VREF based on an external voltage VDD.The reference potential VREF is a potential that is used as a referencefor determining whether the internal potential VPP fed back via thepower source line 90 has reached a predetermined level. In the controlcircuits 40 and 50, it is determined whether the internal potential VPPhas reached the predetermined level by comparing the reference potentialVREF with a detection potential that is obtained by step down of theinternal potential VPP using a resistive divider. When a result ofdetermination shows that the internal potential VPP has not reached thepredetermined level, the control circuits 40 and 50 cause the internalvoltage generating circuits 20 and 30 to perform a pumping operation,and when the result of determination shows that the internal potentialVPP has reached the predetermined level, suspends the pumping operationof the internal voltage generating circuits 20 and 30. With thisoperation, the internal potential VPP that is supplied to the loadcircuit 10 via the power source line 90 is stabilized to a desiredlevel.

The command decoder 70 is a circuit that activates the state signal ST(shifts up the state signal ST to the high level) or deactivates thestate signal ST (shifts down the state signal ST to the low level) basedon a command signal input from a command terminal 3. The example shownin FIG. 1 shows command signals used in a DRAM. Therefore, a content ofthe command signal is represented by a combination of signals /RAS,/CAS, /WE, and /CKE. The state signal ST is deactivated in a case wherethe command signal indicates entering an operation mode in which theload of the load circuit 10 becomes considerably small. When thesemiconductor device is a DRAM, this case includes a case where aself-refresh command is issued, a case where a clock enable signal /CKEis deactivated, and a case where a precharge command is issued.

The power-on detection circuit 80 is a circuit that detects a poweractivation of the semiconductor device. Upon detecting the poweractivation, the power-on detection circuit 80 activates the power-onsignal PON. The power-on signal PON is supplied to the control circuits40 and 50. Therefore, when the power-on signal PON is activated, thecontrol circuits 40 and 50 start operations.

FIG. 2 is a block diagram showing a configuration of the control circuit40. As shown in FIG. 2, the control circuit 40 includes a detectioncircuit 41, an oscillator circuit 42, and a control signal outputcircuit 43.

The detection circuit 41 is a circuit that detects the level of theinternal potential VPP based on the reference potential VREF. When theinternal potential VPP is a predetermined level or higher, the detectioncircuit 41 deactivates a detection signal DS (shifts down the detectionsignal DS to the low level), and suspends an operation of the oscillatorcircuit 42. On the other hand, when the internal potential VPP is lowerthan the predetermined level, the detection circuit 41 activates thedetection signal DS (shifts up the detection signal DS to the highlevel), and resumes the operation of the oscillator circuit 42. Anoperation of the detection circuit 41 is allowed by an activation of thepower-on signal PON.

The oscillator circuit 42 is a circuit that receives the detectionsignal DS and the state signal ST and generates an oscillator signalOSC. Specifically, when the state signal ST is in an activated state(high level), if the detection signal DS is activated to the high level,the oscillator signal OSC having a predetermined cycle is output, and ifthe state signal ST is deactivated to the low level, the oscillatorsignal OSC is fixed to the low level. On the other hand, when the statesignal ST is in a deactivated state (low level), the oscillator signalOSC is fixed to the low level regardless of the level of the detectionsignal DS.

The control signal output circuit 43 is a circuit that receives theoscillator signal OSC and the state signal ST and outputs the signals Ato F. When the state signal ST is activated to the high level, thecontrol signal output circuit 43 generates the signals A to F that aresynchronized with the oscillator signal OSC. On the other hand, when thestate signal ST is deactivated to the low level, the control signaloutput circuit 43 fixes the signals A to F respectively to predeterminedlogical levels.

FIG. 3 is a circuit diagram of the control signal output circuit 43.

As shown in FIG. 3, the control signal output circuit 43 includes a NANDgate circuit G1 that receives the oscillator signal OSC and the statesignal ST, an inverter circuit INV that inverts the oscillator signalOSC, and an AND gate circuit G2 that receives an output of the invertercircuit INV and the state signal ST. The oscillator signal OSC is outputas the signals A and F, an output of the NAND gate circuit G1 is used asthe signal C, and an output of the AND gate circuit G2 is used as thesignals B, D, and E.

With this configuration, when the state signal ST is the high level(activated state), the signals A, C, and F have the same phase as theoscillator signal OSC, and the signals B, D, and E have an oppositephase to the oscillator signal OSC. On the other hand, when the statesignal ST is the low level (deactivated state), the signal C is fixed tothe high level, and the signals B, D, and E are fixed to the low level.Because the oscillator signal OSC is fixed to the low level when thestate signal ST is deactivated, the levels of the signals A and F alsobecome the low level. The signals A to F that are generated in thismanner are supplied to the internal voltage generating circuit 20.

FIG. 4 is a circuit diagram of the internal voltage generating circuit20.

As shown in FIG. 4, the internal voltage generating circuit 20 includestransistors Tr1 to Tr8 and capacitors CAP0 to CAP4. Among thetransistors Tr1 to Tr8, the transistor Tr5 is a P-channel MOStransistor, while the other transistors are all N-channel MOStransistors. As for the capacitors CAP0 to CAP4, it is possible to useMOS gate capacitances.

Specifically, the transistor Tr1 is connected between a line to whichthe power source potential VDD is supplied and an internal node NP0, andits gate electrode is connected to an internal node NP1. Similarly, thetransistor Tr2 is connected between the line to which the power sourcepotential VDD is supplied and the internal node NP1, and its gateelectrode is connected to the internal node NP0. The internal node NP0is a node to which the signal A is supplied via the capacitor CAP3, andthe internal node NP1 is a node to which the signal B is supplied viathe capacitor CAP2.

The transistor Tr3 is connected between the line to which the powersource potential VDD is supplied and an internal node N2, and its gateelectrode is connected to the internal node NP1. The internal node N2 isa node at which a boost potential MVPP is generated. The outputtransistor Tr8 is connected between the internal node N2 and an outputterminal OUT. With this configuration, the boost potential MVPP issupplied to the power source line 90 shown in FIG. 1 via the outputterminal OUT for a period when the output transistor Tr8 is switched on.

A gate electrode of the output transistor Tr8 is connected to aninternal node NP2. The internal node NP2 is connected to the line towhich the power source potential VDD is supplied, via the transistor Tr7of which a gate electrode is connected to the internal node NP1. Thesignal F is supplied to the internal node NP2 via a level shifter LS andthe capacitor CAP4. The level shifter LS is a circuit that converts anamplitude of the signal F from VDD to VPP.

Furthermore, the transistors Tr4 to Tr6 are connected in series betweenthe line to which the power source potential VDD is supplied and a lineto which the ground potential GND is supplied. A gate electrode of thetransistor Tr4 is connected to the internal node NP1, the signal D issupplied to a gate electrode of the transistor Tr5, and the signal E issupplied to a gate electrode of the transistor Tr6. The signal C issupplied to an internal node N1, which is a connection point of thetransistor Tr4 and the transistor Tr5, via the capacitor CAP0. Aninternal node N1′, which is a connection point of the transistor Tr5 andthe transistor Tr6, is connected to the internal node N2 via thecapacitor CAP1.

The capacitors CAP0 and CAP1 are capacitors for pumping the internalnode N2, so that they are designed to have sufficiently largercapacitances than the other capacitors CAP2 to CAP4 for driving the gateelectrodes. Therefore, although a leakage current between the electrodesdoes not practically matter in the capacitors CAP2 to CAP4, it causes asignificant problem in the capacitors CAP0 and CAP1.

With this configuration, when levels of the signals A, C, and F are thelow level and levels of the signals B, D, and E are the high level, boththe capacitors CAP0 and CAP1 are charged to a VDD level as shown in FIG.5A, which is an equivalent circuit diagram. This is a period when acharge operation is performed. On the other hand, when the levels of thesignals A, C, and F are the high level and the levels of the signals B,D, and E are the low level, the capacitors CAP0 and CAP1 enters a stateshown in FIG. 5B, which is an equivalent circuit diagram. This is aperiod for a discharge operation in which the capacitors CAP0 and CAP1that are charged to the VDD level by the charge operation are subject topumping. By this discharge operation, the internal nodes N1 and N1′ arestepped up to about two times the VDD level, and the internal node N2 isstepped up to three times the VDD level. Therefore, by alternatelyrepeating the charge operation and the discharge operation, it ispossible to generate the internal potential VPP having ideally threetimes the VDD level.

FIG. 6 is a waveform diagram for explaining an operation of thesemiconductor device according to the present embodiment.

As shown in FIG. 6, the operation of the internal voltage generatingcircuit 20 is determined by logical levels of the detection signal DSand the state signal ST. Specifically, a state of the operation isdivided into a first state where both the levels of the state signal STand the detection signal DS are the high level (activated level), asecond state where the state signal ST is the high level (activatedlevel) and the detection signal DS is the low level (deactivated level),and a third state where the state signal ST is the low level(deactivated level).

The first and second states correspond to an active state of theinternal voltage generating circuit 20, in which the internal voltagegenerating circuit 20 is controlled such that the internal potential VPPthat appears on the power source line 90 converges to a predeterminedpotential. Therefore, when the detection circuit 41 detects that theinternal potential VPP that appears on the power source line 90 is lowerthan the predetermined potential, the detection signal DS is changed tothe high level, by which an operation of generating the internalpotential VPP is performed.

That is, the signals A to F are changed in synchronization with theoscillator signal OSC, by which the internal voltage generating circuit20 repeats the charge operation shown in FIG. 5A and the dischargeoperation shown in FIG. 5B in an alternate manner. As shown in FIG. 6,in the charge operation, because the signal C (a signal applied to afirst electrode of the capacitor CAP0) becomes a GND level and theinternal node N1 (a second electrode of the capacitor CAP0) becomes theVDD level, a charge voltage of the capacitor CAP0 becomes VDD (a firstvoltage). Similarly, because the internal node N1′ (a first electrode ofthe capacitor CAP1) becomes the GND level and the internal node N2 (asecond electrode of the capacitor CAP1) becomes the VDD level, a chargevoltage of the capacitor CAP1 also becomes VDD (the first voltage). Onthe other hand, in the discharge operation, because the signal C ischanged to the VDD level (the first voltage), the internal node N1 isideally stepped up to two times the VDD level (a second voltage).Similarly, because the internal node N1′ is changed to the VDD level(the second voltage), the internal node N2 is ideally stepped up tothree times the VDD level (a third voltage).

Meanwhile, when the detection circuit 41 detects that the internalpotential VPP that appears on the power source line 90 is higher thanthe predetermined potential, the detection signal DS becomes the lowlevel, by which the operation of generating the internal potential VPPis suspended. In this case, because the oscillator signal OSC is fixedto the low level, the internal voltage generating circuit 20 ismaintained in the state of the charge operation shown in FIG. 5A.

On the other hand, the third state corresponds to a standby state of theinternal voltage generating circuit 20, in which the operation of theinternal voltage generating circuit 20 is suspended. In this case, theinternal voltage generating circuit 20 is not maintained in the state ofthe charge operation, unlike the second state described above, thesignal C becomes the high level, and the levels of the signals A, B, D,E, and F become the low level. With this operation, as shown in FIG. 7A,which is an equivalent circuit diagram, only a threshold voltage Vt (afourth voltage) of the transistor Tr4 is applied to both ends of thecapacitor CAP0, and a voltage applied to the both ends of the capacitorCAP1 becomes zero (a fourth voltage). The transistor Tr4 is a transistorfor charging the capacitor CAP0 to the VDD level (the first voltage).

With this arrangement, the voltages applied to the capacitors CAP0 andCAP1 are reduced as compared to a case where the internal voltagegenerating circuit 20 is maintained to the state of the charge operationshown in FIG. 5A. That is, if the internal voltage generating circuit 20maintained to the state of the charge operation shown in FIG. 5A, thevoltages applied to the both ends of the capacitors CAP0 and CAP1 areVDD, as shown in FIG. 5A. However, in the present embodiment, becausethe voltages applied to the both ends of the capacitors CAP0 and CAP1are considerably small in a standby state, the leakage current isconsiderably reduced. The high level of the signal C in the standbystate can be set at not VDD level but VDD-Vt level. This can be realizedby supplying the high level of the signal C in the active state viaP-cannel MOS transistor and supplying the high level of the signal C inthe standby state via N-cannel MOS transistor. In this case because thevoltage of the capacitors CAP0 and CAP1 can be substantially zero, theleakage current is further reduced. In addition, because the signal F isthe low level in a standby state, the output transistor Tr8 is switchedoff, and the power source line 90 and the internal node N2 of theinternal voltage generating circuit 20 are cut off.

Because levels of the signals A and F in a standby state is notsubstantially affected by the voltages applied to the capacitors CAP0and CAP1, it is not essential to fix the signals A and F to the lowlevel, but one or both of the signals A and F can be set to the highlevel. This means that the levels of the signals A and F can be set tothe same level as that in the discharge operation in an active state.However, if the signal F is set to the high level in a standby state,the output transistor Tr8 is switched on, and the power source line 90and the internal node N2 of the internal voltage generating circuit 20are short-circuited, resulting in a flow of the leakage current throughthe capacitor CAP1. Furthermore, if both the signals A and F are set tothe high level in a standby state, the operation becomes the same as thedischarge operation, and thus if the state signal ST makes a transitionwith a high frequency, the same operation as the boost operation isperformed with a high frequency, regardless of the level of the internalpotential VPP that appears on the power source line 90. This results ina possibility that the level of the power source line 90 continues torise. Considering these aspects, it is preferable that the levels of thesignals A and F in a standby state be fixed to the low level, asdescribed above.

Although the level of the signal C is set to the high level in the aboveexample, it can also be set to the low level. In this case, as shown inFIG. 7B, which is an equivalent circuit diagram, the voltage applied tothe both ends of the capacitor CAP0 becomes VDD-Vt. As a result,although the leakage current is larger than that of the example shown inFIG. 7A, it is possible to sufficiently reduce the leakage current ascompared to the case of maintaining the internal voltage generatingcircuit 20 to the charge operation shown in FIG. 5A. Besides, because itsuffices that the signals A to F are all set to the low level in thisexample, there is an advantage that the control is easy.

As described above, in the present embodiment, because the voltagesapplied to the both ends of the capacitors CAP0 and CAP1 are lower thanVDD when the internal voltage generating circuit 20 is in a standbystate, it is possible to reduce the leakage current in a standby state.

Furthermore, although the internal voltage generating circuit 20 thatgenerates a boost potential is exemplified in the explanations of thepresent embodiment, the application target of the present invention isnot limited thereto, and it can be also applied to an internal voltagegenerating circuit that generates a negative potential that is lowerthan the ground potential GND, for example.

FIG. 8 is a circuit diagram of an internal voltage generating circuit100 that generates a negative potential.

The internal voltage generating circuit 100 shown in FIG. 8 is a circuitthat generates a negative potential VBB, including capacitors CAPA toCAPD and transistors Tr11 to Tr16. Specifically, signals A to D aresupplied to one ends of the capacitors CAPA to CAPD, respectively, andinternal nodes a to d, which are other ends of the capacitors CAPA toCAPD, are connected to the ground potential GND via the transistors Tr11to Tr14, respectively. The transistors Tr11 to Tr14 are all P-channelMOS transistors. Gate electrodes of the transistors Tr11 and Tr12 areconnected to the internal node c, and gate electrodes of the transistorsTr13 and Tr14 are connected to the internal node b.

The transistor Tr15 is connected between the internal node a and theoutput terminal OUT, and a gate electrode of the transistor Tr15 isconnected to the internal node b. Similarly, the transistor Tr16 isconnected between the internal node d and the output terminal OUT, and agate electrode of the transistor Tr16 is connected to the internal nodec. The transistors Tr15 and Tr16 are all N-channel MOS transistors.

FIG. 9 is an operational waveform diagram of the internal voltagegenerating circuit 100.

As shown in FIG. 9, an operation of the internal voltage generatingcircuit 100 is also determined by the logical levels of the detectionsignal DS and the state signal ST. Specifically, a state of theoperation is divided into a first state where both the levels of thestate signal ST and the detection signal DS are the high level(activated level), a second state where the state signal ST is the highlevel (activated level) and the detection signal DS is the low level(deactivated level), and a third state where the state signal ST is thelow level (deactivated level). That is, this is the same as the case ofthe internal voltage generating circuit 20 described above.

The first and second states correspond to an active state of theinternal voltage generating circuit 100, in which the internal voltagegenerating circuit 100 is controlled such that the negative potentialVBB that appears on the power source line 90 converges to apredetermined potential. Therefore, when it is detected that thenegative potential VBB is higher than the predetermined potential, thedetection signal DS is changed to the high level, by which an operationof generating the negative potential VBB is performed. In this case, thesignals A to D are changed with a predetermined cycle. On the otherhand, when it is determined that the negative potential VBB is lowerthan the predetermined potential, the detection signal DS is changed tothe low level, by which the operation of generating the negativepotential VBB is suspended.

Besides, when the state signal ST is changed to the low level, the stateof the operation is changed to a standby state, which is the thirdstate, and the operation of the internal voltage generating circuit 100is suspended. In this case, because the signals A to D are all changedto the low level, the voltages applied to the both ends of thecapacitors CAPA to CAPD are reduced as compared to an active state. Withthis operation, it is possible to reduce the leakage current in astandby state. In order to perform such a control, as shown in FIG. 10,it suffices to use an AND gate circuit G3 that receives the state signalST and the oscillator signal OSC and to set an output of the AND gatecircuit G3 as the signals B and D.

It is apparent that the present invention is not limited to the aboveembodiments, but may be modified and changed without departing from thescope and spirit of the invention.

For example, although the internal voltage generating circuit 20 shownin FIG. 4 is configured to generate the internal potential MVPP that isideally stepped up to three times the VDD level (precisely,2VDD<MVPP<3VDD) by using the two capacitors CAP0 and CAP1 that areconnected in series, it is also acceptable to use three or morecapacitors according to a necessary voltage. In addition, it is alsoacceptable to use only one capacitor.

Furthermore, although the semiconductor device shown in FIG. 1 includesthe internal voltage generating circuit 30 that is constantly in anactive state, as well as the internal voltage generating circuit 20 thatcan enter a standby state, the internal voltage generating circuit 30 isnot necessarily to be constantly in an active state. For example, itsuffices that the internal voltage generating circuit 30 is in an activestate only when the internal voltage generating circuit 20 is in astandby state. In addition, as long as the internal potential VPP can bepromptly raised to a predetermined potential upon the internal voltagegenerating circuit 20 being changed from a standby state to an activestate, the internal voltage generating circuit 30 can be omitted.

What is claimed is:
 1. A method for controlling a charge pumpcomprising: alternatively charging a first capacitor to a first voltagedifference and discharging the first capacitor by applying a secondvoltage to a first electrode of the first capacitor to generate a thirdvoltage greater in absolute value than the first voltage difference andgreater in absolute value than the second voltage on a second electrodeof the first capacitor in an active state of the charge pump; andapplying a fourth voltage difference less than the first voltagedifference to the first capacitor in a standby state of the charge pump.2. The method as claimed in claim 1, wherein the first voltagedifference is VDD and the second voltage is VDD.
 3. The method asclaimed in claim 2, wherein the fourth voltage difference is VDD-Vt. 4.The method as claimed in claim 2, wherein the fourth voltage differenceis Vt.
 5. The method as claimed in claim 2, wherein the third voltage is2VDD.
 6. The method as claimed in claim 1, wherein the first capacitoris a MOS gate capacitor.
 7. The method as claimed in claim 1, furthercomprising alternatively charging a second capacitor to the firstvoltage difference and discharging the second capacitor by applying thethird voltage to a first electrode of the second capacitor to generate afifth voltage greater in absolute value than the third voltage on asecond electrode of the second capacitor in the active state of thecharge pump.
 8. The method as claimed in claim 7, further comprisingapplying a sixth voltage difference less than the first voltagedifference to the second capacitor in the standby state of the chargepump.
 9. The method as claimed in claim 8, wherein the sixth voltagedifference is zero.
 10. The method as claimed in claim 7, wherein thefirst voltage difference is VDD and the second voltage is VDD.
 11. Themethod as claimed in claim 10, wherein the fourth voltage difference isVDD-Vt.
 12. The method as claimed in claim 10, wherein the fourthvoltage difference is Vt.
 13. The method as claimed in claim 10, whereinthe third voltage is 2VDD and the fifth voltage is 3VDD.
 14. The methodas claimed in claim 7, wherein the first and second capacitors are MOSgate capacitors.